Semiconductor wafer fabrication requires strict control of all aspects of the production process to minimize defects and improve product yield for incorporation into high-level electronic devices such as computers. The measurement of trace (sub-ppb) element impurities is critical in production details such as the raw materials, fabrication environment / equipment, and chemical reagents used in wafer production.
Inductively Coupled Plasma Mass Spectrometry (ICP-MS) is an important technique for the measurement of trace element impurities. Teledyne CETAC offers a variety of specialized sample handling and sample introduction accessories for ICP-MS applications for semiconductors, as well as solid sample introduction options via laser ablation systems utilized for material analysis, sample mapping and depth profiling
